RF Power for Plasma Processing
"RF Power for Plasma Processing" provides an introduction to RF systems as applied to plasma processing. Topics include:
- Fundamentals of the glow discharge, RF plasma and sputtering
- RF delivery system from generator through the match to the chamber
- Transmission line theory
- RF power components
- The function of the match and various types of matching network
- Tuning
- Diagnostics and troubleshooting
Participants will learn about RF systems through the set up and operation a small sputtering system. This will include striking the plasma, optimizing power transfer to the plasma through the matching network and applying a V/I Probe as a tool for RF system diagnostics.
Training options for this topic:
Open-enrollment classroom training
Customized training event
Download "Technical Training from MKS"
Need help?
Contact MKS Instruments by sending an email or call 800-227-8766 or 978-284-4000.
© 2008 by MKS Instruments